Rutile Semiconductors Bixbyite A Multilayers Selenization CIGSe Oxides V2O3 Integrated optics Scanning electron microscopy A3 Physical vapor deposition processes B3 Solar cells Functionalization Band gap Residual stress B2 Semiconducting indium compounds Sol-gel Atomic force microscopy Biofilms microbiens B2 Quaternary Mott insulator TEM Spectroscopic ellipsometry Alloying Non-volatile memory Transmission electron microscopy A-CNx A1 Characterization Carbon Nanotube Biomembranes PECVD Carbon B1 Inorganic compounds Buffer Couple Optical properties Aluminium nitride Magnetron sputtering Amyloid precursor Anatase Alzheimer's disease Vanadium Sesquioxide Mass spectrometry AlN Applications industrielles Sputtering CH4 Nanocomposite Optical waveguides X-ray diffraction NEXAFS Etching A Chalcogenides Transfert d'énergie Chalcogenide Physical vapor deposition Resistive switching Structure Colloidal solution Calcined clay Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation Plasma etching 3 nm in size Capacitance Optical interferometry Copper Biocapteurs X-ray photoelectron spectroscopy SF 6 B2 Semiconducting alloys Thin films Band alignment CNTs’ collapse Plasmas froids Biomasse Bipolar resistive switching BRS Films BOMBARDMENT Titanium dioxide AZO thin films Thin film Atomic layer etching XPS C Photoelectron spectroscopy Ambipolar material Low-pressure plasma processing CHLORINE PLASMAS Avalanche breakdown Adsorption Kirkendall effect Nanotubes CaTiO3Pr^3^+ TiO2 A Thin films Annealing Aryl-diazonium salts AuCu alloy B Chemical synthesis Ablation laser Amorphous Mott insulators